具有25nm分辨率的波帶片的SEM圖像X-Ray波帶片
高質(zhì)量的X射線光學(xué)系統(tǒng)，具有經(jīng)過驗證的分辨率、效率和可靠性、低成本，適用于ptychography、STXM、TXM和相位對比成像的軟X射線和硬X射線。優(yōu)勢
利用不同的金屬（金或鎳）可以提高一系列能量的效率。該圖為從ANT波帶片軟件生成的圖像。
高分辨率波帶片可在大范圍的能量范圍內(nèi)提供的分辨率和效率。18 nm（Δr）分辨率的波帶片提供高分辨率，水窗效率高于20％。18 nm Au FZP圖像，直徑270μm，中心光闌設(shè)計。
Applied Nanotool的波帶片可用于各種應(yīng)用，包括大直徑的ptychography和幾毫米的<1 nm縫合誤差。直徑為0.85毫米的波帶片圖像
高相位對比成像，適用于分辨率為50 nm及以下的硬X射線應(yīng)用。波帶片的均勻性是高相位襯度成像的關(guān)鍵組成部份。軟X-Ray指標(biāo)
低于5keV(<0.25nm)的X射線通常被歸類為軟X射線，該射線比高能X射線更容易被吸收。通常，波帶片不需要相同的厚度效率，并且允許更高分辨率成像。軟/細(xì)X射線的一系列波帶板選項可滿足特定要求。
| Device | Outer Zone Width ΔR n(nm) | Thickness (µm) | Outer Diameter (µm) | (# of zones) E/ΔE Limit | ~ Focal Length (µm) | Estimated Lead Time |
|---|---|---|---|---|---|---|
| NZP-50um-12nm | 12 | 0.05 + 0.01 | 50 | 1059 | 144 | Please Contact |
| NZP-65um-15nm | 15 | 65 | 1096 | 235 | ||
| SZP?90um?15nm | 15 | <0.1 | 90 | 1514 | 325 | 2-3 |
| SZP?120um?15nm | 120 | 2019 | 433 | |||
| SZP?200um?18nm | 18 | <0.15 | 200 | 2797 | 868 | In Stock |
| SZP?270um?18nm | 270 | 3775 | 1172 | |||
| SZP?320um?18nm | 320 | 4473 | 1389 | |||
| SZP-200um-25nm | 25 | <0.24 | 200 | 2007 | 1207 | In Stock |
| SZP?250um?25nm | 250 | 2509 | 1510 | |||
| SZP-300um-25nm | 300 | 3010 | 1811 | |||
| SZP-360um-25nm | 360 | 3612 | 2173 | |||
| TZP?160um?50nm | 50 | <0.75 | 160 | 801 | 1934 | 2 – 3 |
| TZP?280um?50nm | 280 | 1401 | 3384 | |||
| TZP?750um?200nm | 200 | <0.75 | 750 | 938 | 36292 | 1 – 3 |
| TZP?1250um?200nm | 1250 | 1563 | 60487 | |||
| *For estimated efficiency of zone plate, please see generated graphs below or download our zone plate software. | ||||||
硬X-Ray指標(biāo)
高于5-10keV的X射線從柔弱轉(zhuǎn)變?yōu)橛瞂射線，在那里它們能夠更好地穿透樣品以提供更好的成像。硬X射線菲涅耳波帶片需要高縱橫比功能，以便為5 keV以上的能量提供足夠的效率和分辨率。我們目前的光學(xué)系統(tǒng)可根據(jù)所需的能量為亞25 nm – 100 nm成像提供超高分辨率。堆疊硬X射線（通過雙重處理或芯片對準(zhǔn)）可以顯著提高我們設(shè)備的效率。 硬X射線的波帶片選項范圍可用于特定要求。
| Device | Outer Zone Width ΔR n(nm) | Thickness (µm) | Outer Diameter (µm) | (# of zones) E/ΔE Limit | Energy Range (keV) | Estimated Lead Time (months) |
|---|---|---|---|---|---|---|
| HZP-50-25nm | 25 | >0.65 | 50 | 500 | 1.5 to 10 | 2 – 3 |
| HZP-75-25nm | 75 | 750 | 2 – 3 | |||
| HZP?100um?42.5nm | 42.5 | >0.8 | 100 | 588 | 2 to 12 | 2 – 3 |
| HZP?85um?50nm | 50 | >0.9 | 85 | 425 | 2 to 12 | 2 – 3 |
| HZPX?85um?50nm | >1.7 | 5.5 to 20 | 4 – 6 | |||
| HZP?180um?50nm | >0.9 | 180 | 900 | 2 to 12 | 2 – 3 | |
| HZP?550um?50nm | >0.9 | 550 | 2750 | 2 to 12 | 2 – 3 | |
| HZPX?550um?50nm | >1.5 | 5.5 to 20 | 4 – 6 | |||
| HZP-400um-100nm | 100 | >1.2 | 400 | 1000 | 2.5 to 8 | 2 – 3 |
| HZPX?400um?100nm | >2.6 | 8 to 30 | 4 – 6 | |||
| HZP?400um?120nm | 120 | >1.5 | 400 | 834 | 5 to 25 | 2 – 3 |
| HZPX?400um?120nm | >2.6 | 8 to 30 | 4 – 5 | |||
| HZP?750um?200nm | 200 | >2.2 | 750 | 938 | 7 to 20 | 3 – 4 |
| HZPX?750um?200nm | 200 | >3.6 | 12 to 50 | 4 – 5 | ||
| *For estimated efficiency of zone plate, please see generated graphs below or download our zone plate software. All zone plate diameters can be customized for specific setups. Standard frame sizes are 3 mm x 3 mm with SiN membranes (100 nm). | ||||||
Oxide Interlock process for Hard X-Ray Optics
Zone plate efficiency for binary zone plates requires high aspect ratio structures which can survive high flux imaging systems. The “Oxide Interlock” option creates small interconnecting channels between metal zone of silicon dioxide which is transparent to hard X-rays and does not swell or distort, even when not under vacuum. These have been shown to significantly increase the zone plate efficiency and lifetime.
Oxide Interlock process with silicon dioxide links between the gold zones, improving performance and lifetime of the zone plate optics. This comes standard on all hard X-ray optics. The silicon dioxide is highly transparent for hard X-rays.中心光闌
中心光闌和外光闌選項可以顯著改善波帶板成像，降低光學(xué)器件的0次級并提高其使用壽命。各種厚度可達(dá)3μm的芯片可用或大于10μm作為單獨的芯片。 高分辨率18 nm外區(qū)菲涅耳波帶片頂部電鍍4μm厚中心止點
4 um thick central stop electroplated on top of Fresnel zone plate with high resolution 18 nm outer zonesCustom Designs and Frame Size
Custom designs and frame sizes can be developed for specific applications. We are able to fabricate devices down to 0.1 mm and below. Our standard frame sizes are 5 mm x 5 mm and membrane thickness can be down to 50 nm while the 100 nm thickness is ideal for energies above 5 keV. We also offer silicon carbide membranes for those requiring long-lifetime membranes.
Custom silicon nitride, silicon carbide or silicon membranes down to 0.9 mm half dimensions. Image above showing 1 cm x 1 cm (top), 5 mm x 5 mm (bottom left) and 0.9 mm x 5 mm chips.XY Stage for Zone Plates/Central Stop Alignment
Our custom XY stage allows micro-scale alignment of a central stop and zone plate and also allows for a possible blast-shield to be mounted. XY micrometer scale stage holder for central stop and zone plate alignment with blast shield
波帶片計算器
Applied Nanotools offers a free online zone plate calculating theoretical efficiencies and for calculating Fresnel zone plates parameters. Please see this link to visit the webpage: Zone Plate Calculator. For the legacy software please download here (note, this version is being replaced with the new website version).
