- 用途及特點(diǎn)
Use and Features
●適應(yīng)于玻璃、塑膠等基片上鍍制各類光學(xué)薄膜和其它機(jī)能性裝飾薄膜的批量化生產(chǎn)
●采用******的電氣控制系統(tǒng),良好的用戶操作界面,大大減輕作業(yè)人員的負(fù)擔(dān)
●RCS自動(dòng)鍍膜控制系統(tǒng)******整個(gè)鍍膜過程自動(dòng)完成
●基片架轉(zhuǎn)動(dòng)采用磁流體密封技術(shù)******真空密封,中心驅(qū)動(dòng)方式******薄膜產(chǎn)品的均勻性及重復(fù)性
●優(yōu)化的配置、嚴(yán)格的品質(zhì)控制******產(chǎn)品質(zhì)量的穩(wěn)定性和重復(fù)性
●排氣速率.鍍膜效率的提高,大大縮短了產(chǎn)品生產(chǎn)周期
GFC系列高性能全自動(dòng)真空鍍膜機(jī)
Series GFC High Quality Vacuum Thin Film Coater
技術(shù)參數(shù)
Technical parameters
Series GFC High Quality Vacuum Thin Film Coater
技術(shù)參數(shù)
Technical parameters
真空室體 Vacuum chamber | Ø1300*1450mm,SUS304材質(zhì) φ1,300*1,450mm,SUS304 material |
排氣系統(tǒng) Air exhaust system | KT-500擴(kuò)散泵2臺(tái),總排氣速率(加載水冷阱)11,000Pa.L/S Two sets of KT-500 diffusion pump, with a gross exhaust velocity (loaded with water-cooling trap) of 11,000Pa.L/S; |
極限真空≤2.0E-4Pa;排氣時(shí)間≤15min(大氣→4.0E-3Pa) Ultimate vacuum ≤2.0E-4Pa; exhaust time ≤15min (atmosphere→4.0E-3Pa) | |
基片架 Substrate holder | Ø1200四葉扇形基片架, 3~30rpm轉(zhuǎn)速;可選配行星基片架、翻轉(zhuǎn)機(jī)構(gòu)等 φ1200 four-blade sector-shaped substrate holder, rotating speed 3~30rpm; a planet substrate holder or a turnover mechanism can also be matched; |
加熱機(jī)構(gòu) Heating means | ******350℃,PID控制;恒溫20min后溫度均勻性250±10℃ Maximum 350℃, PID control; temperature homogeneity being 250±10℃ after 20 min of constant temperature control; |
石英監(jiān)控儀 Quartz monitor | 進(jìn)口石英晶體膜厚監(jiān)控儀;2點(diǎn)(或6點(diǎn))晶振探頭 Imported quartz crystal monitor on film depth, with two-point (or six-point) crystal probe; |
電子束蒸發(fā)源 Electron beam evaporation source | 10KW電子槍 2臺(tái),12點(diǎn)坩堝和環(huán)形坩堝 Two sets of 10KW electron gun, 12-point crucible or ring-shaped crucible; |
電阻蒸發(fā)源 Resistance evaporation source | 功率4KW(一對(duì)、兩對(duì)或多對(duì)) Power of 4KW (one pair, two pairs or more pairs) |
膜厚修正板 Film depth correction board | 2個(gè)自動(dòng)可倒式膜厚修正機(jī)構(gòu) Two automatic film depth correction mechanisms of collapsible type |
反應(yīng)氣體 Reaction gas | APC自動(dòng)壓強(qiáng)控制儀,質(zhì)量流量計(jì) APC automatic pressure controller, mass flowmeter |
離子源 Ion source | 可選配Kafman、Holl或RF離子源 Available for matching of Kafman, Holl or RF ion source |
低溫抽氣裝置 Low temperature evacuating equipment | 進(jìn)口低溫抽氣裝置有效捕集水蒸汽,******溫度-130℃ The imported low-temperature evacuating equipment can effectively gather water vapor; minimum temperature -130℃ |
RCS系統(tǒng) RCS system | 基于WINDOWS的全自動(dòng)鍍膜軟件 Windows-based full automatic coating software |
控制系統(tǒng) Control system | 控制柜(液晶觸摸式彩色顯示器),遠(yuǎn)程控制遙控盒 Control cabinet (with liquid crystal color touch screen), remote-control box for remote control |
消耗能源 Energy consumption | 3相,220/380VAC,50Hz;~70KVA Three-phase, 220/380VAC,50Hz;~70KVA |
水流量140L/min,壓力0.3~0.5MPa Water flow 140L/min, pressure 0.3~0.5MPa | |
壓縮空氣0.5MPa~0.7MPa Compressed air 0.5MPa~0.7MPa | |
重 量 Weight | 凈重約4500Kg Net weight about 4,500 Kg |
安裝空間 Installation space | W4000mmxD6000mmxH2700mm W4,000mm×D6,000mm×H2,700mm |